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Silane,(3-azidopropyl)triethoxy-

  • CasNo:83315-69-9

Product Description

Factory supply Silane,(3-azidopropyl)triethoxy- 83315-69-9 with sufficient stock and high standard

  • Molecular Formula: C9H21N3O3Si
  • Molecular Weight: 247.37

83315-69-9 Relevant articles

Covalent immobilization of aggregation-induced emission luminogens in silica nanoparticles through click reaction

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Fluorescent silica nanoparticles (FSNPs)...

Silicium dioxide nanoparticles as carriers for photoactivatable co-releasing molecules (PhotoCORMs)

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Highly active enzymes immobilized in large pore colloidal mesoporous silica nanoparticles

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An original "click and bind" approach for immobilizing copper hexacyanoferrate nanoparticles on mesoporous silica

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We present an original approach for prep...

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Silica matrices hosting transition metal...

LIGHT TRIGGERABLE GENE EDITING FORMULATION, IN VIVO EDITING METHOD, AND USES THEREOF

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Paragraph 0084, (2020/12/07)

The disclosure comprises a formulation c...

83315-69-9 Process route

(3-chloropropyl)triethoxysilane
5089-70-3

(3-chloropropyl)triethoxysilane

3-azidopropyltriethoxysilane
83315-69-9

3-azidopropyltriethoxysilane

Conditions
Conditions Yield
With Caswell No. 744A; In butanone; for 72h; Inert atmosphere; Reflux;
96%
With Caswell No. 744A; In dimethyl sulfoxide; at 60 ℃;
95%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 20h; Reflux; Inert atmosphere;
95%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 120 ℃; for 24h;
92%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h;
91%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h;
91%
With Caswell No. 744A; butyrylaldehyde; for 72h; Reflux;
90%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 6h;
90%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
89%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere; Schlenk technique;
89%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 48h; Inert atmosphere; Reflux;
82%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 24h; Inert atmosphere; Reflux;
81%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 48h; Reflux; Inert atmosphere;
80%
With Caswell No. 744A; N,N,N-tributyl-1-butanaminium iodide; In butanone; for 120h; Reflux; Inert atmosphere;
80%
With Caswell No. 744A; tetra-n-butylammonium azide; In acetonitrile; for 70h; Reflux;
76%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 18h; Inert atmosphere; Reflux;
74%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 18h; Inert atmosphere; Reflux;
74%
With Caswell No. 744A; sodium iodide; In dimethyl sulfoxide; at 60 ℃; for 18h; Schlenk technique; Inert atmosphere;
74%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 5h; Inert atmosphere;
68%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
64%
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
64%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; at 90 ℃; for 18h; Inert atmosphere;
60%
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 18h; Inert atmosphere; Reflux;
60%
With Caswell No. 744A; sodium iodide; In dimethyl sulfoxide; at 60 ℃; for 24h; Inert atmosphere;
41%
With Caswell No. 744A; N,N,N-tributyl-1-butanaminium iodide; In butanone; for 50h; Heating;
With Caswell No. 744A; potassium iodide; In N,N-dimethyl-formamide; at 90 - 100 ℃;
With Caswell No. 744A; sodium iodide; In toluene; at 70 - 80 ℃;
Multi-step reaction with 2 steps
1: sodium iodide / acetone / 72 h / Reflux; Inert atmosphere
2: Caswell No. 744A / N,N-dimethyl-formamide / 72 h / 50 °C / Inert atmosphere
With Caswell No. 744A; sodium iodide; In N,N-dimethyl-formamide; acetone;
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; Reflux;
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 18h; Reflux; Inert atmosphere;
With Caswell No. 744A;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 8h; Inert atmosphere;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 80 ℃; for 4h; Inert atmosphere;
With Caswell No. 744A; In acetonitrile; for 20h; Reflux;
Multi-step reaction with 2 steps
1: sodium iodide / acetone / 72 h / Reflux
2: Caswell No. 744A / N,N-dimethyl-formamide / 72 h / 50 °C
With Caswell No. 744A; sodium iodide; In N,N-dimethyl-formamide; acetone;
With Caswell No. 744A;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 70 - 100 ℃;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h;
With Caswell No. 744A; N-hexadecyl-N,N,N-trimethylammonium bromide; In acetonitrile; for 48h; Inert atmosphere; Reflux;
With Caswell No. 744A; tetra-n-hexylammonium bromide; In acetonitrile; at 82 ℃; for 18h; Inert atmosphere;
With Caswell No. 744A;
With Caswell No. 744A; N,N,N-tributyl-1-butanaminium iodide; In N,N-dimethyl-formamide; for 24h; Inert atmosphere; Heating;
With Caswell No. 744A; sodium iodide; In N,N-dimethyl-formamide; at 90 ℃; for 12h; Inert atmosphere;
With Caswell No. 744A; In N,N-dimethyl-formamide; at 90 ℃; for 4h; Inert atmosphere;
With Caswell No. 744A; In acetonitrile; for 48h; Reflux; Inert atmosphere;
With Caswell No. 744A; Schlenk technique; Inert atmosphere;
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 24h; Reflux;
With Caswell No. 744A; tetrabutylammonium bromide; In acetonitrile; for 36h; Reflux;
3-bromopropyltriethoxysilane
52090-18-3

3-bromopropyltriethoxysilane

3-azidopropyltriethoxysilane
83315-69-9

3-azidopropyltriethoxysilane

Conditions
Conditions Yield
In ethanol;

83315-69-9 Upstream products

  • 5089-70-3
    5089-70-3

    (3-chloropropyl)triethoxysilane

  • 52090-18-3
    52090-18-3

    3-bromopropyltriethoxysilane

  • 57483-09-7
    57483-09-7

    (3-iodopropyl)triethoxysilane

83315-69-9 Downstream products

  • 1616428-68-2
    1616428-68-2

    C41 H44 N6 O4 S3 Si

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